Companies
Electro Scientific Industries
ESI Inaugurates First Dual-Beam
ESI Inaugurates First Dual-Beam |
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| Written by Subhasis Chatterjee | |
| Wednesday, 18 July 2007 | |
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Electro Scientific Industries, Inc. the renowned provider and frontrunner of world-class photonics and laser systems for microengineering applications, today announced here of the introduction of Model 9850UV, the first dual-beam, ultraviolet (UV) laser link-processing system for the most advanced nodes of DRAM and NAND Flash memory applications in the international continuum. It has been affirmed in this respect on the behalf of the Company, that the 9850UV happens to be the first memory repair system in the global spectrum that have been duly applied in the combination of proprietary dual-beam architecture of the ESI in conjunction with the advantages of the patented UV laser technology. There has been the further acknowledgement of the information that in the recent days thanks to the advanced superior technology and highly developed capabilities of the system, the ESI has been warded an order form a prominent and internationally renowned global supplier of high-performance DRAM devices. The delivery of the 9850UV systems in this respect in destined to initiate in the second quarter of ESI's fiscal year 2008.
ESI is a frontrunner and leading supplier of world-class production laser systems having the direction of aiding its microelectronics customers to attain compelling yield and productivity gains. From its commencement in 1944 the company's industry-leading, application-specific products has been engaged in concentrating and augmenting electronic-device performance in three key sectors like semiconductors, components and electronic interconnect. The aspiration has been to enable exactitude in fine-tuning of device microfeatures in high-volume manufacturing environments. To the various echelons of the Company, the 9850UV system had its first development in response to the flourishing implementation of ESI's 9850IR platform. ESI's new system has been found featuring the novel 9850 architecture that make the most of the two beams from a single laser to facilitate parallel processing. This new processing method endows with probable throughput improvements that range up to 90 percent at the time of being compared with conformist laser repair systems, while improving the cost of ownership (CoO) through the effectual provision of more output per square meter of clean room space. The system has been produced with the central indication of keeping the system much ahead of others. However, the foremost spirited advantage of UV lasers lay in the fabrication of a unique combination of ultra-small laser spot size and large depth-of-focus, a crucial thought for future small-spot link processing. The 9850UV provides superior performance by combining the UV laser's small-spot capability with the dramatic CoO gains that dual-beam processing delivers. Speaking on this to the newsmen Nick Konidaris, the ESI President and CEO said, "ESI has a proven track record of innovation." "We were the first to use UV technology in laser link-processing tools, the first to develop the dual-beam laser architecture, and the first to put these two concepts together in one system. This system is another example of how ESI is delivering innovative solutions that support next-generation, high-end memory production requirements for our valued customers worldwide. The first order for this exciting new system was received from a major memory producer in July." |